Organic amines are gaseous molecular pollutants (AMCs) in clean rooms of semiconductor wafer fabs. AMC is a general term for gaseous pollutants that may have a negative impact on semiconductor process yield, and can be divided into several categories based on their properties: acids (MA), bases (MB), condensable substances (MC), and dopants (MD). Nitrogen containing molecules such as ammonia, organic amines, and amides belonging to MB will undergo a simple and common acid-base nucleation mechanism in the air, producing particulate matter mainly composed of salts, which are likely to settle on the surface of wafers or various external surfaces in clean rooms. In recent years, the semiconductor industry has also continuously discovered the adverse effects of various organic amines and amides in clean room environments on processes such as photolithography and etching. In order to reduce the negative effects of MBs on the process and yield, it is necessary to conduct precise long-term monitoring of various alkaline substances present in the air inside the lithography machine and in the clean room. The increasingly sophisticated semiconductor process technology and synchronized high yield targets require higher monitoring and control of AMC in clean rooms. In terms of the detection of organic amine substances, the sensitivity of ion chromatography (IC) conductivity detectors can no longer meet the current needs of the semiconductor industry, and some compounds are difficult to separate on chromatography. The mass spectrometer (MS) has the characteristics of high sensitivity and compound separation based on ion mass to charge ratio. Combining IC-MS can not only improve the sensitivity of organic amine detection, but also shorten the running time of one sample and greatly improve the sample detection flux.